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...Thin film deposition can be achieved through two methods physical vapour pvd or chemical cvd vapor comprises a group of surface coating technologies used for decorative tool and other equipment applications it is fundamentally vaporization process in which the basic mechanism an atom by transfer material from solid phase to back gradually building on coated case reactive depositing reacts with gaseous environment co deposited form compound such as nitride oxide carbide carbonitride evaporation one oldest metal films aluminum gold metals are heated point then evaporate covering substrate all takes place under vacuum very carefully controlled atmosphere degrees units shown below rough bar mbar high ultra space atm mm torr hg p s i pressure mean free path number impingement monolayer cm rate kt pd d diameter gas molecule formation layer determined impinging molecules mkt sec where m mass thermal also known this thermally vaporized proceeds potential differences little no collisions normal...