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...Physical vapor deposition pvd encompasses a group of vacuum techniques used for depositing thin films different materials onto various substrates by means process is dry method to coat an entire object or substrate at once the reactive processes are common hard coating metal they combine active gas such as nitrogen oxygen methane with plasma bombardment main difference methods way produce and in general it can be categorized into following groups mechanical evaporation sputtering ion plating pulse laser pld pla milling this produces nano powder form where material placed under very high energy balls made stainless up size from nanometer thermal e beam mbe vaporation one most film although oldest still widely laboratory industry generated evaporating subliming source which subsequently condensed solid on target melted evaporated sublimed using electric resistance heater pressure chamber figure bellow raised initially low that allows deposited initial necessary because reach without reac...